ChemAcoustic Technologies, Passive Aerosol Dryer's are
available in Stand-Alone or as a OEM kit for wet bench integration.
Specific design for MEMS and other high aspect ratio devices and
Particle Neutral performance @ 120nm using a motionless process and just
2-4 mls of Isopropyl Alcohol per cycle. Also available is the Mega-Pix
single substrate dry in dry out cleaning tool.