Amorphous film,deposited by magnetron sputtering deposition method on a Si<111> substrate,thickness=1.2um,value obtained from nanoindentation method and load displacement curves, data is acquired at plastic depths around 100 nm.
Thin Solid Films,214(1992), p.56
Hardness
15 .. 22 GPa
Hot pressed,crystal structure:tetragonal,value obtained by nanoindentation method.
Thin Solid Films,214(1992), p.56
Hardness
8 .. 15 GPa
literature data,crystal structure:tetragonal, hardness is obtained by Vickers indentation method.
Thin Solid Films,214(1992), p.56
Hardness
10 .. 12 GPa
Reaction sintered,crystal structure:tetragonal,value obtained by Vickers indentation method.
Thin Solid Films,214(1992), p.56
Young's Modulus
225 .. 232 GPa
Amorphous film,deposited by magnetron sputtering deposition method on a Si<111> substrate,thickness=1.2um,value obtained from nanoindentation method and load displacement curves, data is acquired at plastic depths around 100 nm.
Thin Solid Films,214(1992), p.56
Young's Modulus
438 .. 463 GPa
Hot pressed,crystal structure:tetragonal,value obtained by nanoindentation method.
Thin Solid Films,214(1992), p.56
Young's Modulus
344 .. 439 GPa
literature data,crystal structure:tetragonal, hardness is obtained by Vickers indentation method.