I believe that the <100> plane is a local minimum in etching speed, so that
the <100> plane would eventually get revealed.  This is why you can get
smooth bottoms on an anistropically etched pit.

David Nemeth
Senior Engineer
Sophia Wireless, Inc.


-----Original Message-----
From: [email protected]
[mailto:[email protected]]On Behalf Of li zhiping
Sent: Tuesday, April 22, 2003 9:27 PM
To: [email protected]
Subject: [mems-talk] off-axis wafer etching


Hi,
I want to ask a question. If I make a protecting pattern, say by LTO,on a
weird wafer surface, which has a 9 degree to <100>, and put it in KOH or
TMAH for tens minutes, Could the wafer be etched to the <100> at the
unprotected area? Thanks!
Zhiping





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