Just wondering if there is anyone use double layer or triple layer PR.
To increase the thickness of the metal for lift off process or plating
process.
Thanks,
Johnny
===========================================
Johnny H.HE,  Ph.D. Candidate
Division of Electrical Engineering, Engineering
Department,Cambridge University,CB2 1PZ, UK
or Downing College, Cambridge, CB2 1DQ ,UK
Email: [email protected]
Tel:+44 1223 765199 Fax:+44 1223 332662
===========================================

-----Original Message-----
From: [email protected]
[mailto:[email protected]] On Behalf Of
[email protected]
Sent: 08 May 2003 12:56
To: [email protected]
Subject: MEMS-talk Digest, Vol 7, Issue 8

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Today's Topics:

   1. Re: Cr and Au deposition by using sputter (R. Brent Garber)
   2. Re: Cr and Au deposition by using sputter (Rodger Cary)
   3. Re: Cr and Au deposition by using sputter ([email protected])
   4. RE: RE: Anisotropic Cu Wet etching (David Nemeth)
   5. Cheap Resist Spinner... (Sampo Tuukkanen)
   6. RE: Cheap Resist Spinner... (Cain, Mike)
   7. Fabrication of MEMS Device (Amit Savkar)
   8. RE: process resistant insulator (beaton@npphotonics (Bill Eaton))
   9. Re: Cheap Resist Spinner... ([email protected])
  10. RE: Cr and Au deposition by using sputter (leonid bikov)
  11. LPCVD on 100 (Jan Hoh)


----------------------------------------------------------------------

Message: 1
Date: Wed, 07 May 2003 10:24:57 -0400
From: "R. Brent Garber" 
Subject: Re: [mems-talk] Cr and Au deposition by using sputter
To: General MEMS discussion 
Message-ID: <[email protected]>
Content-Type: text/plain; charset="us-ascii"

Carmen,
Cr/Au sputtered layers are very common for a mask when wet etching.  Au
is
easily etched in a KI / I2 mixture and your Cr should be shiny.  Is your
gold cloudy?  This would show an air leak in your system.  A commercial
CR-7
etch works well to etch Cr.  I have never seen green on Cr in my 22
years of
sputtering these layers.  Are you using Ar as the sputter gas?  Are you
sure
your substrate is VERY clean before sputtering?

Brent

Carmen wrote:

> Hi all,
>
>     I would like to know whether someone who have tried to deposit Cr
> and Au by using sputter and then etched them successfully. I faced the
> problem that the Cr layer cannot be etched completely after etching
the
> Au layer, and the color of the Cr layer is not silver, it is like
green.
> Is there any reason to cause the Cr layer become green if I use
sputter
> to deposit it? Do you have any idea for what the green layer is? (Is
it
> a compound or oxide).
> Thank you very much.
>
> Best Regards,
> Carmen
>
> _______________________________________________
> [email protected] mailing list: to unsubscribe or change your list
> options, visit
http://mail.mems-exchange.org/mailman/listinfo/mems-talk
> Hosted by the MEMS Exchange, providers of MEMS processing services.
> Visit us at http://www.memsnet.org/
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------------------------------

Message: 2
Date: Wed, 7 May 2003 10:25:37 -0400
From: "Rodger Cary" 
Subject: Re: [mems-talk] Cr and Au deposition by using sputter
To: "General MEMS discussion" 
Message-ID: <[email protected]>
Content-Type: text/plain;       charset="iso-8859-1"

The green layer is likely chromium oxide which can be varying shades of
green.  I don't know at what point in your process where this oxidizing
is
occurring, but it sounds like that is what is happening.

----- Original Message -----
From: "Carmen" 
To: 
Sent: Wednesday, May 07, 2003 10:01 AM
Subject: [mems-talk] Cr and Au deposition by using sputter


> Hi all,
>
>     I would like to know whether someone who have tried to deposit Cr
> and Au by using sputter and then etched them successfully. I faced the
> problem that the Cr layer cannot be etched completely after etching
the
> Au layer, and the color of the Cr layer is not silver, it is like
green.
> Is there any reason to cause the Cr layer become green if I use
sputter
> to deposit it? Do you have any idea for what the green layer is? (Is
it
> a compound or oxide).
> Thank you very much.
>
> Best Regards,
> Carmen
>
>
>
> _______________________________________________
> [email protected] mailing list: to unsubscribe or change your list
> options, visit
http://mail.mems-exchange.org/mailman/listinfo/mems-talk
> Hosted by the MEMS Exchange, providers of MEMS processing services.
> Visit us at http://www.memsnet.org/
>



------------------------------

Message: 3
Date: Wed, 07 May 2003 11:21:10 -0400
From: [email protected]
Subject: Re: [mems-talk] Cr and Au deposition by using sputter
To: [email protected] (General MEMS discussion)
Message-ID: <[email protected]>
Content-Type: text/plain; charset=iso-8859-1

You probably have a leak in your sputtering system. If deposited
properly chrome layer should not be green. Bob Henderson


------------------------------

Message: 4
Date: Wed, 7 May 2003 10:44:00 -0400
From: "David Nemeth" 
Subject: RE: [mems-talk] RE: Anisotropic Cu Wet etching
To: "General MEMS discussion" 
Message-ID: 
Content-Type: text/plain;       charset="iso-8859-1"

Another way to get a vertical sidewall would be to use an isotropic
etchant
(e.g. FeCl), and undercut your mask pattern.  You'd have to compensate
the
mask pattern to get the right linewidth.  If you undercut enough, the
sidewalls should approach vertical.

David Nemeth
Senior Engineer
Sophia Wireless, Inc.
14225-C Sullyfield Circle
Chantilly, VA
-----Original Message-----
From: [email protected]
[mailto:[email protected]]On Behalf Of [email protected]
Sent: Tuesday, May 06, 2003 11:08 AM
To: General MEMS discussion
Subject: Re: [mems-talk] RE: Anisotropic Cu Wet etching


The only way I know of for you to produce the desired sidewall profile
is to
do a photo lift-off process. You can contact Bill Moffet at Yield
Engineering Service who contributes to this forum a lot. He is an expert
in
this area. They are located in Bay area California. Bob Henderson

_______________________________________________
[email protected] mailing list: to unsubscribe or change your list
options, visit http://mail.mems-exchange.org/mailman/listinfo/mems-talk
Hosted by the MEMS Exchange, providers of MEMS processing services.
Visit us at http://www.memsnet.org/



------------------------------

Message: 5
Date: Wed, 7 May 2003 18:26:23 +0300
From: "Sampo Tuukkanen" 
Subject: [mems-talk] Cheap Resist Spinner...
To: "MemsTalk" 
Message-ID: <[email protected]>
Content-Type: text/plain;       charset="iso-8859-1"

Hi!

I just broke our fotoresist spinner and...Ok, it was broken when I went
to
clean room...

Does anyone know, where I could supply relatively cheap manual R&D
resist
spinner?
It can be second-hand or new.

- Sampo Tuukkanen

_______________________________________________________
Sampo Tuukkanen, Room K215, Department of Physics,
PB 35 (YFL), FIN-40014 University of Jyväskyl? FINLAND
E-mail: [email protected]
Tel: +35814 260 2392, Fax: +358 14 260 2351



------------------------------

Message: 6
Date: Wed, 7 May 2003 13:12:41 -0400
From: "Cain, Mike" 
Subject: RE: [mems-talk] Cheap Resist Spinner...
To: "General MEMS discussion" 
Message-ID: 
Content-Type: text/plain;       charset="iso-8859-1"

Laurell.com makes an inexpensive table top spinner.

-----Original Message-----
From: Sampo Tuukkanen [mailto:[email protected]]
Sent: Wednesday, May 07, 2003 11:26 AM
To: MemsTalk
Subject: [mems-talk] Cheap Resist Spinner...


Hi!

I just broke our fotoresist spinner and...Ok, it was broken when I went
to
clean room...

Does anyone know, where I could supply relatively cheap manual R&D
resist
spinner?
It can be second-hand or new.

- Sampo Tuukkanen

_______________________________________________________
Sampo Tuukkanen, Room K215, Department of Physics,
PB 35 (YFL), FIN-40014 University of Jyväskyl? FINLAND
E-mail: [email protected]
Tel: +35814 260 2392, Fax: +358 14 260 2351


_______________________________________________
[email protected] mailing list: to unsubscribe or change your list
options, visit http://mail.mems-exchange.org/mailman/listinfo/mems-talk
Hosted by the MEMS Exchange, providers of MEMS processing services.
Visit us at http://www.memsnet.org/


------------------------------

Message: 7
Date: Wed, 7 May 2003 18:56:57 -0400
From: "Amit Savkar" 
Subject: [mems-talk] Fabrication of MEMS Device
To: 
Message-ID: <002501c314eb$f6d8cfa0$af0e6389@AMITSAVKAR>
Content-Type: text/plain; charset="iso-8859-1"

Dear All,
This is Amit Savkar a Phd Candidate at University of Connecticut at
Storrs.
I am a new member to this discussion group, and would like to ask a few
basic questions regarding fabrication of MEMS device. Our research group
is
actively seeking vendors who can actually fabricate a device, with
decent
reliability. We have particulars of this device and would like to know
vendors, universities who had reliable established MUMPS process for
fabrication.
It would be highly appreciated if any fellow members can throw light on
the
same.
Thanks
Regards
Amit Savkar

PhD Candidate
University of Connecticut
Department of Mechanical Engineering
Dynamics and Vibration Lab
191 Auditorium Road U 3139
Storrs CT 06226
Lab : 860 486 5339

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------------------------------

Message: 8
Date: Wed, 7 May 2003 14:31:08 -0700
From: "beaton@npphotonics \(Bill Eaton\)" 
Subject: RE: [mems-talk] process resistant insulator
To: "'General MEMS discussion'" 
Message-ID: <004e01c314df$f9cbc750$4a64a8c0@bille>
Content-Type: text/plain;       charset="iso-8859-1"

I'm surprised that polyimide didn't fare very well. Does it swell too
much
in toluene to be useful.

My limited understanding of polyimide led me to believe that once it's
imidized, polyimide is very difficult to get rid of. Usually imidization
temperatures are around 400°C, though there are a few low temperature
varieties that imidize around 300°C. Is it possible that you weren't
imidizing? I think there are a lot of useful applications of polyimide
that
don't require imidization. It might be possible that you used a recipe
for
one of those applications.

Bill Eaton, Ph.D.
Materials & Analysis Manager
NP Photonics

> -----Original Message-----
> From: [email protected]
> [mailto:[email protected]]On Behalf Of David Wood
> Sent: Thursday, May 01, 2003 4:35 AM
> To: [email protected]
> Subject: [mems-talk] process resistant insulator
>
>
> Dear all,
>
> We would like some advice on the best insulator layer to withstand the
> following process steps:
>
> 1. HF/ethanol etch for a few minutes,
>
> 2. toluene at 190 C for 4 hours.
>
> As this insulator will be on already fabricated FETs any
> temperature steps
> cannot be too high. We have tried (unsuccessfully)
> photoresist (S1813 and
> AZ4562), spin on glass and polyimide. We can do PECVD oxide
> and nitride, but
> these will come off instantly in the HF. Would we similarly
> be wasting our
> time with any sputter coated oxides deposited elsewhere - ZnO, TiO2?
>
> Any help for process suggestions with existing materials, or
> new options,
> would be useful.
>
> Many thanks,
>
> David Wood,
> Reader,
> School of Engineering,
> University of Durham,
> South Road,
> Durham,
> DH1 3LE.
>
> Tel: +44 191 334 2464
> Fax: +44 191 334 2407
>
> email: [email protected]
>
>
>
> _______________________________________________
> [email protected] mailing list: to unsubscribe or change your list
> options, visit
> http://mail.mems-exchange.org/mailman/listinfo/mems-talk
> Hosted by the MEMS Exchange, providers of MEMS processing services.
> Visit us at http://www.memsnet.org/
>



------------------------------

Message: 9
Date: Wed, 07 May 2003 13:04:33 -0400
From: [email protected]
Subject: Re: [mems-talk] Cheap Resist Spinner...
To: [email protected] (General MEMS discussion)
Message-ID: <[email protected]>
Content-Type: text/plain; charset=iso-8859-1

We sell a manual system new for $22,500. Please contact me directly if
you have an interest.
Bob Henderson  480-968-8818 x 11  Trion Technology


------------------------------

Message: 10
Date: Thu, 8 May 2003 09:02:30 +0200
From: "leonid bikov" 
Subject: RE: [mems-talk] Cr and Au deposition by using sputter
To: "General MEMS discussion" 
Message-ID: <[email protected]>
Content-Type: text/plain;       charset="us-ascii"

Hi, Carmen,
Do your wafers see temperature above 250C after sputtering?
Interdiffusion of Cr to Au at temperatures above 250C is well known
problem and this may cause the problems with etching.

Best regards,

Leonid

-----Original Message-----
From: Carmen [mailto:[email protected]]
Sent: Wednesday, May 07, 2003 4:02 PM
To: [email protected]
Subject: [mems-talk] Cr and Au deposition by using sputter


Hi all,

    I would like to know whether someone who have tried to deposit Cr
and Au by using sputter and then etched them successfully. I faced the
problem that the Cr layer cannot be etched completely after etching the
Au layer, and the color of the Cr layer is not silver, it is like green.
Is there any reason to cause the Cr layer become green if I use sputter
to deposit it? Do you have any idea for what the green layer is? (Is it
a compound or oxide). Thank you very much.

Best Regards,
Carmen



_______________________________________________
[email protected] mailing list: to unsubscribe or change your list
options, visit http://mail.mems-exchange.org/mailman/listinfo/mems-talk
Hosted by the MEMS Exchange, providers of MEMS processing services.
Visit us at http://www.memsnet.org/


------------------------------

Message: 11
Date: Wed, 07 May 2003 15:04:23 -0400
From: Jan Hoh 
Subject: [mems-talk] LPCVD on 100
To: [email protected]
Message-ID: 
Content-Type: text/plain; charset=US-ASCII; format=flowed

I am looking for 50-100 nm LPCVD nitride on 100 silicon (100-600 um
thick).  The size of the wafer and the  electrical properties do not
matter.  I just need 2-5  6" wafers (or equivalent) - not a whole run -
and was hoping someone might have some extras they do not need.  I
checked many of the surplus places with no luck.

Jan



------------------------------

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***************************************