dear colleagues
     I have been working on a PECVD SiN 2000A dielectric directly on Au layer
(In a new STS PECVD equip.capactive coupled plasma, 8" plates,temperature 300
centidegree ).However the film is full of uniformly scattered black dots 1
micron or less (film extrusion under SEM )in diameter. No such dots found on SiN
on Silicon surface. Can anyone give me some explain and/or improvement advise.
BTW,Need I deposite oxide before SiN deposition? can you give me a good way to
pattern the SiN without affecting the Au/Cr beneath? ThX in advance.



　　　　　　　　致
礼！


　　　　　　　　miaomin
　　　　　　　　[email protected]
　　　　　　　　　　2005-05-13