Dear Miaomin,


I am not sure where you are located. STS maintains a team of process
engineers to answer questions such as these. Please feel free to contact us
at any time with your questions. You can reach our PECVD process team at
[email protected] or [email protected]


Best Regards
Andrew Tucker
Surface Technology Systems

------------------------------

Message: 6
Date: Fri, 13 May 2005 10:35:38 +0800
From: "miaomin" 
Subject: [mems-talk] black dots on SiN
To: "[email protected]" 
Message-ID: <[email protected]>
Content-Type: text/plain;      charset="GB2312"

dear colleagues
     I have been working on a PECVD SiN 2000A dielectric directly on Au
layer (In a new STS PECVD equip.capactive coupled plasma, 8"
plates,temperature 300 centidegree ).However the film is full of uniformly
scattered black dots 1 micron or less (film extrusion under SEM )in
diameter. No such dots found on SiN on Silicon surface. Can anyone give me
some explain and/or improvement advise.
BTW,Need I deposite oxide before SiN deposition? can you give me a good way
to pattern the SiN without affecting the Au/Cr beneath? ThX in advance.



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¡¡¡¡¡¡¡¡¡¡¡¡¡¡¡¡miaomin
¡¡¡¡¡¡¡¡¡¡¡¡¡¡¡¡[email protected]
¡¡¡¡¡¡¡¡¡¡¡¡¡¡¡¡¡¡¡¡2005-05-13