Dear members,
Does anyone have background information of how black silicon can
be formed in RIE system? In my case, see black silicon on silicon wafer
after long (more than 10mins) CF4/H2 plasma exposure. The surface is also
powdery with this black stuff. If you know anything about it or any good
reference paper, would you please let me know? Thanks a lot.
Yours sincerely,
Isaac Chan
Ph.D. Candidate
Dept. Electrical & Computer Engineering
University of Waterloo
200 University Ave. W
Waterloo, Ontario, Canada
N2L 3G1
Tel: (519) 729-6409, ext. 6014
Fax: (519) 746-6321
[email protected]
http://www.ece.uwaterloo.ca/~a-sidic
