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MEMSnet Home: MEMS-Talk: Etching SiO2 without affecting Aluminum
Etching SiO2 without affecting Aluminum
2003-05-15
bobo
2003-05-15
Tobias Kramer
2003-05-15
beaton@npphotonics (Bill Eaton)
2003-05-15
Kirt & Erika Zipf-Williams
2003-05-15
Mark McNie
2003-05-16
Neal Ricks
2003-05-15
Pavel Neuzil
2003-05-15
Dave Kharas
2003-05-16
[email protected]
2003-05-16
David Springer
Etching SiO2 without affecting Aluminum
Pavel Neuzil
2003-05-15
Dear Bobo,
you do not have that many options, oversaturated HF
(between 70 and 80% !!!) can do the job. YOu can
purchase 73% from Fluka but it takes time as it is
classified as weapon (it is used to enrich Uranium),
the other option is Pelchem (www.pelchem.com) from
South Africa. I would go for the later one without any
hesitation. The delivery will be much cheaper and
faster.
Do not forget that the liquid is very dangerous,
really good fllow box is essnetial and you HAVE to use
isopropanol before dipping it into a DI water after
the etching. The whole trick is that the Al must not
get into a contact with diluted HF.
Pavel




________________________________________________
Dear all,
does anyone knows what wet etchant can etching silicon
dioxide without
etching aluminum at the same time?   Thanks.


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