Hi Seh-Won,
A recipe used in the Berkeley Microlab is used below for an Aluminum
etch.
Pressure 250 mtorr
RF Top 250 watts
BCl3 50 sccm
N2 50 sccm
Cl2 30 sccm
CHCl3 30 sccm
etch rate ~5000-7000 A/min
Phil Tabada
>From: "Seh-Won Ahn"
>Reply-To: General MEMS discussion
>To: "General MEMS discussion"
>Subject: [mems-talk] Aluminium etching
>Date: Mon, 19 May 2003 11:22:11 +0900
>
>
>Hello everyone,
>
>Does anybody have an experience with Aluminium etching for several hundred
>nm-pitch gratings?
>I am using BCl3, Cl2, O2 gases for the etching. But, PR damage is severe.
>Could you tell me proper etch mask, gas ratios, rf power, etc?
>Thank you in advance.
>
>Sincerely,
>Seh-Won Ahn
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