Sandhya,
        The main virtue of vacuum vapor prime is you alter the surface tension
of the wafer to exactly the surface tension you require for good photo resist
spread and adhesion.  Contact me directly and I will arrange to get some wafers
treated for you.  I will also try to find some company in your geographical area
that has a primer you could probably get to use.  Bill Moffat

-----Original Message-----
From: sandhya sandhya [mailto:[email protected]]
Sent: Thursday, May 29, 2003 11:14 AM
To: [email protected]
Subject: [mems-talk] question regarding photolith


Hai all,
Thanks for the help. but i tried all those and the recipe i am using is:
1)spinning at 500 rpm with ramp=500rpm/sec to spread out the resist to the edge.
2)then ramping the speed to 1500rpm  with ramp=500rpm/sec to obtain 12micron
thick resist.

Then i even tried cleaning the wafers using pirahna before spinning resist.
So can anyone suggest me what I can do more.
sincerely






Sandhya Reddy
Research assistant
Boise state university
Ph.No. 208-426-5639

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