Try using a negative resist as an adhesive and positive for your
lithograph. Negative resists stand up well to chemicals used for pos.
resist. Then after you're finished with the processing on the front use
Nanostrip or equivalent to remove both resist layers.

-Mike

>>> [email protected] 06/10/03 08:32AM >>>
I am mounting a wafer with large holes in it onto another wafer in
order to
spin resist on it.  The wafer is delicate, so I'm mounting it with
black
wax.  However, I find the resist solvent (I'm using AZ4210) attacks
the
blackwax a little, leaving a residue on the wafer.

Clear wax (I forget which kind) which dissolves in acetone is worse -
it
dissolves in the photoresist solvent, and creates large, unpatternable
areas
when I spin it.

Because of the fragility of the wafer, I need something that melts so I
can
slide the wafer off easiliy, so using photoresist itself as an
adhesive
won't work.

Has anyone else encountered this problem?  Does anyone know of a
mounting
wax that is not attacked by the photoresist solvent?

David Nemeth
Senior Engineer
Sophia Wireless, Inc.
14225-C Sullyfield Circle
Chantilly, VA
Ph: (703) 961-9573 x206
Fax:(703) 961-9576


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