For film thickness measurement you may find this useful:
http://www.olivetechnology.com/prod01.htm

I am curious what type of photo-resist(s) you are using for the two
layer process.

Debjyoti Banerjee, Ph.D.
Microfluidics Engineer
NanoInk, Inc.
215 E. Hacienda Avenue
Campbell, CA 95008.
Ph: (408) 379-9069 x202
Fax: (408) 379-9072
Email: [email protected]
www.nanoink-inc.com

-----Original Message-----
From: [email protected]
[mailto:[email protected]] Yilei Zhang [[email protected]]
On Behalf Of Yilei Zhang
Sent: Tuesday, June 10, 2003 8:58 AM
To: [email protected]; [email protected]
Subject: [mems-talk] two photoresist layers

Dear colleagues:
Can anyone let me know what you are using to measure the thickness of
two
layers of photoresist? The bottom layer is around 30 nm and the top
layer is
around 1um. the substrate may be silicon or silicon dioxide. Now I am
using
NanoSpec, but was told to be careful with the data, so I want to check
with
other equipment.

Another question is that when I develope the top layer photoresist, how
to
make sure all exposure area are totally removed? so that the bottom
layer can
be pattern. On the other hand, if i can get pattern on the top layer, is
it
enough to say that the developer of the top layer is safe to the bottom
photoresist?

Thanks.

Regards,
Yilei










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