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MEMSnet Home: MEMS-Talk: RIE process parameters for Si Etching
RIE process parameters for Si Etching
2003-06-11
Priyank Gupta
2003-06-12
ShuTing Hsu
2003-06-12
[email protected]
2003-06-13
Blunier, Stefan
RIE process parameters for Si Etching
ShuTing Hsu
2003-06-12
HI Priyank

What kind of etching do you plan to do?
Which chamber? If you give me your baseline recipe and tell me what was
wrong,
Maybe I can help you tune the recipe in.

ShuTing
Electrical Engineering, UCLA


-----Original Message-----
From: [email protected]
[mailto:[email protected]] On Behalf Of Priyank Gupta
Sent: Wednesday, June 11, 2003 4:15 PM
To: [email protected]
Subject: [mems-talk] RIE process parameters for Si Etching




hi!,
I have some problem with etching of silicon using RIE process. I'm
wodering if
anyone knows about the process parameter (about 1-2 micrometer), gas
used,
photresist, pressure, rf power etc. for etching of Si.

Thanks
Priyank Gupta
Research Assistant
ECEN
Oklahoma State University

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