Dear members,

        I am trying to look for any commercially available simulator
software for simulating plasma etching and deposition processes. The
etching process I am interested in is CF4/H2 for etching amorphous silicon
and silicon nitride (and Molybdenum if possible). The deposition process
is PECVD of those silicon based films and sputtering of Mo, Cr, and Al.
Does anyone have information or good recommendation? Thanks in advance.


Yours sincerely,

Isaac Chan

Ph.D. Candidate
Dept. Electrical & Computer Engineering
University of Waterloo
200 University Ave. W
Waterloo, Ontario, Canada
N2L 3G1
Tel: (519) 729-6409, ext. 6014
Fax: (519) 746-6321
[email protected]
http://www.ece.uwaterloo.ca/~a-sidic