Isaac,
      We used to use mass spectrophometer technology for end point detection for
photo resist stripping till we discovered better methods.  The spectrophotometer
was looking for CO and CO2 spectra.  these gasses are generated when O2 plasma
eats an organic.  One of the problems with this type of detector was the fiber
optic detector got eaten by mixed gasses containing CF4 and SF6.  Contact me
directly and I will go into alternative technology.  Bill Moffat 408 629 9047.

-----Original Message-----
From: Isaac Wing Tak Chan [mailto:[email protected]]
Sent: Thursday, June 26, 2003 5:23 PM
To: General MEMS discussion
Subject: [mems-talk] mass spectrometer for RIE end point detection


Hi,

        I would like to know mass spectrometer is a good way for measuring
end point using CF4 and SF6 based chemistry in terms of cost, reliability,
and any lifetime issue as it is exposed in the plasma. Thanks in advance
for any feedback.

Yours sincerely,

Isaac Chan

Ph.D. Candidate
Dept. Electrical & Computer Engineering
University of Waterloo
200 University Ave. W
Waterloo, Ontario, Canada
N2L 3G1
Tel: (519) 729-6409, ext. 6014
Fax: (519) 746-6321
[email protected]
http://www.ece.uwaterloo.ca/~a-sidic


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