There are several options for HF vapor etching:
1. Pour some 49% HF into a non-glass beaker.
Hold the wafer over the beaker for 15 s.
Remove for 15 s (this prevents condensation).
Repeat until done, which may be an hour.
Variations have done using heating of the wafer.
2. Buy a commercial system. The only one I know is
the Excalibur from FSI International of Chaska, Minnesota.
These are relatively new, so don't count on finding a used one
(unless one of the dead optical-switch start-ups has one).
--Kirt Williams, Ph.D. consultant
----- Original Message -----
From: Changping
To: [email protected]
Sent: Tuesday, July 08, 2003 8:12 AM
Subject: [mems-talk] Used equipment for HF vapor dry etch of SiO2
Hi,
I am wondering if any body know where there is such an equipment for
sale. What we need to do is to do SiO2 sacrificial etch by HF vapor. We've a
limited budget so we prefer an used equipment with low price.
Thank you very much and appreciate your reply!
Changping
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