Anupama,

Here is a recipe for 13-15 um thick AZ9260 (depending on exhaust volume)

prebake - 110C, Hotplate, 15', Covered
HMDS - 15', room temp, covered

for 4" wafer - 3.5-5 ml AZ9260
Prespin - 500rpm, 500rpm/s, 10"
Spin - 1000rpm, 500rpm/s, 60"

Softbake - 110C, 2'30", open

Depending on the exhaust volume of spinner, the thickness will vary, 15um
for max. exhaust(open lid) and 13um for no exhaust (closed lid).

this should be more than enough thickness for an hour of etching (in DRIE
chamber at 2-4um/min)!! since your resist coating is not directly seeing the
SF6 plasma, why do u need it this thick ? unless u plan to use it for a thru
wafer etch ...

Hope it helps,

Sunil.

Research Associate, PG
Optical Semiconductor & Devices
EEE, Imperial College
London UK SW7 2BT


Date: Wed, 09 Jul 2003 16:47:48 -0700
From: [email protected]
Subject: [mems-talk] 13um thick resist
To: [email protected]
Message-ID: <[email protected]>

Hello MEMS community,

I am looking for a spin recipie that
will give me a resist thickness of > 13 microns. I use
Clariant
resists AZ4620 and AZ 9260.

This is for a protective backside coating so I will not
expose or develop it. I need to hard bake the resist
sufficiently so that it survives for over 1 hour in SF6
plasma. However the resist side will face the bottom of the
chamber & not the plasma

I would grately appreciate if any of you could give me a
spin
recipie for the above requirement with these two resists
AZ4620 or AZ 9260 in terms of

Spread: rpm, r/s to reach the reqd rpm, time of spin at the
rpm
Level: rpm, r/s to reach the reqd rpm, time of spin at the
rpm

I look forward to hearing from you at the earliest.

Thank you for the help

Sincerely

Anupama