Hi!,

I am doing a research in mems sensor, based on
microhotplate structure. I plan to deposit tin oxide
(SnO2) as an active element of the sensor. I am not
sure whether to use aluminium electrode or gold
electrode for tin oxide deposition. I am also not sure
whether to use dry etching or wet etching to etch
silicon to realize the suspended structure.

These are a few questions regarding this problem:

1) Doed XeF2 (dry etch) etch aluminium electrode?

2) Does tin oxide(SnO2) adhere well to aluminium
electrode?

3) For tin oxide deposition, which electrode is
better, aluminium electrode or gold electrode?

4) Does anybody know which company can perform wet
etching process using EDP (to etch silicon) and also
packaging, with a small quantity, about 3 pieces? EDP
will be supplied by customer.


Thanks in advance.
Regards.

Zaini

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