Hello Michele

What exactly are you trying to do that takes such a long etch. Xenon difluoride
is an isotropic etchant of silicon with nearly infinite selectivity between
silicon and both photo resist and polyimide so it may be ideal for your
application. Please give me a call or send me email with more details on what
you are trying to do and we can talk about it. XACTIX is the overwhelming market
leader in providing equipment for etching silicon using XeF2 so we have the
expertise to let you know if it would work and can help you run some samples if
an experiment seems worth it.

Best Regards
David Springer


>>  Hallo,
 >>  does anyone know if there is a photoresist or
 >>  photosensitive polymmide that can resist a 30 hour
 >>  etch in KOH or TMAH?
 >>  Can you also suggest the best etching conditions for
 >>  the highest selectivity for that matirial and silicon?
 >>  Thank you very much.

 >>  Michele

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