I have used Sulfuric Acid+H2O2 heat up to 100C for 5 min for Cr mask clean.
It will remove all the stuff on them.

Hong Wu
Semicoa

-----Original Message-----
From: [email protected]
[mailto:[email protected]]On Behalf Of
Mighty Platypus
Sent: Thursday, July 31, 2003 11:34 AM
To: General MEMS discussion
Subject: Re: [mems-talk] Mask Clean


With a chrome or iron oxide mask, I use Acetone-Methanol-DI Water-Dry
Nitrogen to clean. Persistent spots can usually be scrubbed (carefully!)
with a clean-room swab or a poly-vinyl-alcohol sponge.

If your mask is emulsion, you might be able to clean it with methanol. Try
to find an area that you can test on, like the corner of a dark-field mask
or the label of a light-field mask.

Jesse Fowler
  UCLA/MAE Dept., 420 Westwood Plaza, Room 37-129, ENGR IV
  Los Angeles, CA 90095-1597 | (310)825-3977
"Observations of nature, no matter how seemingly arcane, are like
peeling off one more layer from the great onion of knowledge"
    -- Don Petit, ISS science officer

On Thu, 31 Jul 2003, Lin, Yaojian wrote:

> Hello Friends,
>
> I am looking for the methods to clean the dirty mask, which may have some
> polymer spots.
>
> Could you please give me some clue?
>
> With many thanks,
>
> Yaojian Lin
>
>
>
>
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