As far as I know, the problem with photoresists was mainly associated with
the solvent, ethylen glycol monomethyl ether acetate (EGEMA, 2-EE, ethyl
cellosolve,2-METHOXYETHYL ACETATE..  cas# 110-49-6)
It was phased out by similar, but much less hazardous propylen glycol
Monomethyl Ether Acetate (CAS# 108-65-6) many photoresists have "P" in the
trade name to stress on the difference.
The TLV (safety limit) for EGEMA is 5 ppm, and 100ppm for PGMEA.
Well, I know some people involved are very sceptical about it..
Generally, if you can smell photoresist - your safety is not doing a good
job at all...

Mike


> -----Original Message-----
> From: [email protected] [SMTP:[email protected]]
> Sent: Friday, August 01, 2003 17:45
> To:   [email protected]; Sarah McQuaide
> Cc:   Pahnit Seriburi; [email protected]
> Subject:      [mems-talk] photoresist concern
>
> Hello MEMS community,
>
> This is regarding reproductive disorders associated with the
> working of photoresists. I was discussing with a colleague
> of mine and it seems that in her past work in cleanrooms her
> general observation was that numerous women of childbearing
> age who were intimately involved in the lithography process,
> were unable to bear children or had high incidences of
> miscarriage.
>
> I would like to know if others have made similar
> observations or where such data can be found. Is it true
> that the solvent vapors from the lithography process that
> one is exposed to even when working under a well ventilated
> fume hood, with a mask can result in
> infertility/miscarriage?
>
> I looked at some of the  MSDS of some of the photoresists we
> commonly use in the lab - the AZ4620, 9260, 1512 and most of
> them indicate that no harmful effect caused to the mother
> will have no harmful effect on the fetus. I understand that
> working in cleanroom esp with the lithography process is not
> advisable during pregnancy but does anyone know of damage
> that can be done by regular use.The developers & resist
> srtip particularly EKC830 seem to be more harmful.
>
> All of us are exposed to solvent fumes during spin-on,
> pre/post bake, development. What is meant by overexposure?
> 3-4 hours/day
> 2-3days/week or 40+hrs a week only with lithography?
>
> Any help towards information in this direction would be
> greatly appreciated.
>
> Looking fwd to hearing from you and working in a safe and
> healthy environment
>
> Sincerely
> Anupama
>
>
> >
> > As this is secondhand information I do not want to become
> > alarmed, but Anupama and I think this would be a good
> > topic to research and discuss, possibly as a topic at our
> > group meeting. I don't know if there is much in the way of
> > published material - we may only find information via the
> > internet- but it is a good issue for women in the lab to
> > be conscious of.
> >
> > Cheers,
> > Sarah
> >
> > Sarah McQuaide
> > Research Engineer, Genomation Lab
> > University of Washington Electrical Engineering Dept.
> > (206) 616-1394
>
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