Yes you are correct, my error, sorry for the mis-information.

Rick




-----Original Message-----
From: [email protected]
[mailto:[email protected]]On Behalf
Of Mac McReynolds
Sent: Monday, August 04, 2003 11:20 AM
To: 'General MEMS discussion'
Subject: RE: [mems-talk] photoresist concern


I think you have your solvents reversed.  Ethylene Glycol Monoethyl Ether
Acetate was the old "bad" solvent.

Mac McReynolds
R&D Manager
Caliper Technologies Corp.
605 Fairchild Drive
Mountain View, CA 94043-2234
Tel:  650-623-0710
Fax:  650-623-0521

> ----------
> From:         Rick Morrison
> Reply To:     General MEMS discussion
> Sent:         Monday, August 4, 2003 8:05 AM
> To:   [email protected]; 'General MEMS discussion'
> Subject:      RE: [mems-talk] photoresist concern
>
> Yes in the late 1980's Intel and Digital Equip. and others were sued by
> workers, the problem chemicals were a solvent named PGMEA and in the 1990
> resist manufactures stated to offer EGMEA solvent so called "safe solvent"
> resist. I believe you can get all sorts of data from OSHA and NISHO on
> this
> effects.
>
> Rick
>
>
> -----Original Message-----
> From: [email protected]
> [mailto:[email protected]]On Behalf
> Of [email protected]
> Sent: Friday, August 01, 2003 5:45 PM
> To: [email protected]; Sarah McQuaide
> Cc: Pahnit Seriburi; [email protected]
> Subject: [mems-talk] photoresist concern
>
>
> Hello MEMS community,
>
> This is regarding reproductive disorders associated with the
> working of photoresists. I was discussing with a colleague
> of mine and it seems that in her past work in cleanrooms her
> general observation was that numerous women of childbearing
> age who were intimately involved in the lithography process,
> were unable to bear children or had high incidences of
> miscarriage.
>
> I would like to know if others have made similar
> observations or where such data can be found. Is it true
> that the solvent vapors from the lithography process that
> one is exposed to even when working under a well ventilated
> fume hood, with a mask can result in
> infertility/miscarriage?
>
> I looked at some of the  MSDS of some of the photoresists we
> commonly use in the lab - the AZ4620, 9260, 1512 and most of
> them indicate that no harmful effect caused to the mother
> will have no harmful effect on the fetus. I understand that
> working in cleanroom esp with the lithography process is not
> advisable during pregnancy but does anyone know of damage
> that can be done by regular use.The developers & resist
> srtip particularly EKC830 seem to be more harmful.
>
> All of us are exposed to solvent fumes during spin-on,
> pre/post bake, development. What is meant by overexposure?
> 3-4 hours/day
> 2-3days/week or 40+hrs a week only with lithography?
>
> Any help towards information in this direction would be
> greatly appreciated.
>
> Looking fwd to hearing from you and working in a safe and
> healthy environment
>
> Sincerely
> Anupama
>
>
> >
> > As this is secondhand information I do not want to become
> > alarmed, but Anupama and I think this would be a good
> > topic to research and discuss, possibly as a topic at our
> > group meeting. I don't know if there is much in the way of
> > published material - we may only find information via the
> > internet- but it is a good issue for women in the lab to
> > be conscious of.
> >
> > Cheers,
> > Sarah
> >
> > Sarah McQuaide
> > Research Engineer, Genomation Lab
> > University of Washington Electrical Engineering Dept.
> > (206) 616-1394
>
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>

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