Lisen,  Try using AZ developer which contains silicates rather than KOH or TMAH.
The etch rates for Al are much less with this developer.  Use a 1:2 (developer:
water)
dilution.  The developer is available from AZ Clarient.

LSWANG  wrote:
Hi,there,
Anyone has experience with patterning Al. I got
problem when developing the photoresist, the Al layer
is etched by the developer. I tried SHipley and AZ
resists, but both have the same problem. THanks
Lisen

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