You might try Shipey CD-30 developer which has worked for folks here
making thin Al devices.

According to a paper at:
http://marcuslab.harvard.edu/how_to/reliable_liftoff.PDF
this is because it "contains a phosphate, which passivates aluminum."

Jim


>Hi,there,
>Anyone has experience with patterning Al. I got
>problem when developing the photoresist, the Al layer
>is etched by the developer. I tried SHipley and AZ
>resists, but both have the same problem. THanks
>Lisen
>
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--

  - Jim Beall 303-497-5989
    [email protected]