Hi everybody,
I have been working with the photoresist AZ4620. I do want to get 8um thick and
my unexpose area 10um-wide lines, which give a large exposed area.
My problem is that I always have bubbles after the exposure. I did split my
exposure time in several small periods with delays of 30sec in between. Even
though I still get those bubbles. I addition, I checked after the first second
of exposure and most of the bubbles are there by this time.  I start to thinking
about the baking time, and reduce it without success.
If anyone of you had work successfully with AZ4620, please can help with ideas
to solve this problems or with a working recipe. I really appreciate any input.
thanks

Giancarlo Corti,
Graduate Student,  Mechanical Engineering
University of Idaho, POBox: 0902
Moscow, ID  83844-0902
Phone: (208) 885-4996
email:  [email protected]
        [email protected]
http://www.uidaho.edu/~cort4258