Hi there,

I have worked with AZ9620 and produced around 10um thick structure. Maybe
you can try and wait around 2-5 min after spinning...before baking it...and
also you can try and start at a lower temperature e.g 88 deg and increased
to 110 deg in the baking process...and then wait for around 30min-1hrs
before exposure.

hope this help...




On Mon, 11 Aug 2003 08:15:56 -0700, Luigi Corti  wrote:

> Hi everybody,
> I have been working with the photoresist AZ4620. I do want to get
> 8um thick and my unexpose area 10um-wide lines, which give a large
> exposed area.
> My problem is that I always have bubbles after the exposure. I did
> split my exposure time in several small periods with delays of 30sec
> in between. Even though I still get those bubbles. I addition, I
> checked after the first second of exposure and most of the bubbles
> are there by this time.  I start to thinking about the baking time,
> and reduce it without success.
> If anyone of you had work successfully with AZ4620, please can help
> with ideas to solve this problems or with a working recipe. I really
> appreciate any input. thanks
>
> Giancarlo Corti,
> Graduate Student,  Mechanical Engineering
> University of Idaho, POBox: 0902
> Moscow, ID  83844-0902
> Phone: (208) 885-4996
> email:  [email protected]
>         [email protected]
> http://www.uidaho.edu/~cort4258
>
>
>
>
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