Hello MEMS community

I am looking for a flouropolymer WET etchant that will
remove the flouropolymer completely

>From information on the web regarding the wet etchants for
Flouropolymers I understand that the wet etchants remove the
F atoms in the fluoropolymer  leaving the C atoms (with
electron deficiencies) behind. When the fluoropolymer is
pulled out of the etchant the C atoms combine with O & H
atoms in the surrounding air to form COOH, CO, or COH groups
that promote adhesion.

I am looking for complete removal of the flouropolymer such
that no C atoms remain.

The fluoropolymer etchant must have minimal or no etch
selectivity to Aluminium and Silicon.

Please let me know if you have any information regarding
Fluoropolymer etchants that have such properties or any
possible sources of such information. Any information in
this regard will be much appreciated.

Looking forward to your replies

Sincerely
Anupama

Anupama V. Govindarajan
Graduate Student - EE MEMS laboratory
Department of Electrical Engineering
University of Washington
Campus Box 352500, Seattle WA 98195
Phone: (206)-221-5340
email: [email protected]