We had a similar question recently regarding a thick nickle layer. One
person suggested depositing the same film on the back side (if possible)
in order to compensate.
-Mike
>>> [email protected] 8/21/2003 1:14:24 PM >>>
You say "huge". What is the actual stress value?
I measure 13e^10 dyne/cm^2 on my wafers.
Ron
-----Original Message-----
From: [email protected]
[mailto:[email protected]]On
Behalf Of Justin Borski
Sent: Tuesday, August 12, 2003 5:28 PM
To: 'General MEMS discussion'
Subject: [mems-talk] stress relaxation by backside etch?
Hello,
I have an application where I have deposited a very thick film of metal
on
the front side of my silicon wafer and then wish to process it through
a
number of additional steps near the end of the process flow, but the
problem
is that the sheet-deposited film stress is so huge that it induces
over
200-microns of wafer bow, compressive. With so much bow on the wafer,
none
of my process tools want to pick the wafer up during the proceeding
steps.
My question is, is there some method of performing a backside process
to
cause the film/wafer combination to relax somewhat to a lower wafer
bow, to
better allow for vacuum-arm wafer pickup? I think annealing is not an
option due to the nature of the metal film; it will only become more
compressive at the temperatures I could anneal.
Thanks for any thoughts,
- Justin
Justin C. Borski
MEMS Program Manager
Advanced MicroSensors Inc.
[email protected]
www.advancedmicrosensors.com
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