Dear colleques,

I am just reading some papers on profile simulations for reactive ion
etching.
I was wondering who were the first groups working on, and which were the
first papers published on this topic.
I have the papers by Ulacia, Petti and McVittie
from 88/89, and papers by Reynolds, Neureuther and Oldham
[J.Vac.Sci.Technol 16(6), 1979] and by N.S. Viswanathan [J.Vac.Sci.Technol.
16(2), 1979].
I was wondering if there were any earlier papers about the profile
simulation of RIE (reactive ion etching).
If you know of (or just remember vaguely) some earlier or just early such
papers, could you tell me some bibliographic informations?

Both Reynolds et al. and Viswanathan make reference to a paper by Jewett,
Hagouel, Neureuther, and Van Duzer (Polymer Eng. Sci. 17, 1977) (V. makes
reference to the conference talk), however, in the context of the string
algorithm. Unfortunately, I don't have access to this journal. Does this
paper by Jewett et al. deal with  reactive ion etching profile simulations,
or is it "just" about algorithms and isotropic etching?


Thanks a lot in advance!

Burkhard