Dear MEMS colleagues,
I was wondering whether anyone has a very good recipe to use CF4/O2 (or
CF4/H2...) to etch single-crystal silicon. I always met problems when using
CF4/O2 (25/5sccm, 50mTorr, 100W, Plasma Thermal 790 RIE) to etch my silicon
samples. The surface of samples seem to be coated by a polymer stuff (looks
like), or just very rough surface because I could not remove it both by Drytak
or ACE/IPA. By the way, I need to etch only 2 micron and prefer anisotropic
etch.
Thanks a lot!!!!


DL