Aluminum Etchant Type A from Transene at 50 C might be selective enough:
Measured etch rates:
Al:     530 nm/min
Al/2%Si: 660 nm/min
Ti:    0 nm/min
Ni:    29 hm/min
TiNi not measured

    --Kirt Williams, Ph.D.    consultant

----- Original Message -----
From: Sagi Daren 
To: 
Sent: Tuesday, September 09, 2003 12:30 AM
Subject: [mems-talk] Al etch


> Hi All
> I am looking for an Aluminum etchant which is highly selective for
> Nickel/Titanium films which lay beneath.
> Have tried some NaOH solutions but they didn't do the work.
> Thank you all for your help
>   S. Daren
>
>       Sagi Daren
> Senior R&D Engineer
>  El-Mul Technologies
> Tel.:972-8-9434184 #43
> [email protected]
>
>
>
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