An SF6 plasma will etch both Ti and TiN.
If you already have a recipe that gives a relatively vertical etch profile,
you can increase the pressure (to reduce the mean-free path)
and lower the power (to reduce the ion energy),
both of which result in less directionality in the etch.

    --Kirt Williams, Ph.D.   consultant

----- Original Message -----
From: laurent gangloff 
To: 
Sent: Thursday, September 11, 2003 5:48 AM
Subject: [mems-talk] RIE titanium etch


> Hi all,
>
> Does anyone know a RIE recipe to etch titanium, or titanium nitride
(sputter
> deposition) isotropically?
>
> Thanks for your advices.
>
> _________________________________________________________________
> MSN Messenger 6 http://g.msn.fr/FR1001/866  : dialoguez en son et en image
> avec vos amis.
>
>
> _______________________________________________
> [email protected] mailing list: to unsubscribe or change your list
> options, visit http://mail.mems-exchange.org/mailman/listinfo/mems-talk
> Hosted by the MEMS Exchange, providers of MEMS processing services.
> Visit us at http://www.memsnet.org/