Hi all,
For the glass, you have to specify how deep you want to ecth.
Cr or Au are not suitable for deep etching.
You must use a Si mask anodically bonded to the glass.
Bye.
trammi a écrit :
> Hi,
>
> Why dont you try with Buffered Hydroflouric acid? It is most easier way
to do and you may require Cr/Au mask to do so. You can realize the required
pattern by well-known lift-off technique.
>
> cheers,
>
> Ramakrishna. T.
>
> "General MEMS discussion" wrote:
>
> Hi all,
>
> I tried glass etching at room temperature with 25% fluorosilicic acid using
> photoresist as a mask. But to my surprise it is not etching the glass even
> after an hour. The glass I used was pyrex 7740.
>
> If any of you have successfully etched glass with fluorosilicic acid, please
> suggest me the exact recipe.
>
> Thanking you all in anticipation,
>
> Keyur Shah
>
> Keyur Shah
> PhD student, CBME Department
> Stevens Institute of Technology
> Castle Point on Hudson, Hoboken, NJ 07030.
> Web address : http://attila.stevens-tech.edu/~kshah5
>
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