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MEMSnet Home: MEMS-Talk: InAs quantum well
InAs quantum well
2003-09-17
Glen Landry
2003-09-18
[email protected]
InAs quantum well
[email protected]
2003-09-18
Glenn:

Have you considered plasma etching these films. The overall ion energy will be
substantially less than using ion milling and if the problem is being caused by
ion damage it might be reduced or eliminated. Please contact my application
engineer Mike Marrs at Trion Technology to discuss sample etching of your films.
Thanks
Bob Henderson 480-968-8818

reply
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