Yilei,
      Try a single wafer Oxygen + CF4 plasma reaction.  What size are your
samples and how many.  I may be able to test them free for you.  Contact me
directly.  Bill Moffat

-----Original Message-----
From: Yilei Zhang [mailto:[email protected]]
Sent: Thursday, October 02, 2003 3:01 PM
To: [email protected]
Subject: [mems-talk] photoresist remove


Dear Members:
I have some samples with photoresist (AZ5209) coating for a long time, now i
cannot
remove it by aceton, stripper, or ultrasonic cleaner. Can anyone give me some
suggestions? Thanks.

Regards,
Yilei Zhang










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