Dear Sir,
Please help me to post the following question in the talking list.
Thank you very much.
Are there anyone who have experience on Indium reflow?
I sputtered the Indium piller on Si wafer and then reflow under around 200 C.
But I did not get a reflowed ball with good shape.
My friend told me that it is due to the oxide film growed during the sputtering
process because Indium is very easy to be oxidized.
In fact the Indium piller is made up of many many microball whose surface is cov
ered with oxide film.
So it is difficult to get a good reflow result.
I tried to use H2 to deoxide the oxide film but the reflow tepmerature is too lo
w and H2 is not functional.
Somebody suggest me to try HCOOH.
Are there anyone who have such experience?
How to get a good relow result?
What about the process parameter？
Best regards,
      Simon