Hi Zhang,
One of the silicon dioxide etchants that have a minimal effect on metal is BOE.
Try it.
Regards,
Kiran.Potluri
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Today's Topics:
1. Chromium Silicide (CrSi2) thin film sputtering !!!!!!!!!
(Imran Ghauri)
2. sio2 etchant (Yilei Zhang)
3. Localized stress measurement (Linda LW Chow)
4. Re: Solgel process / low temperature bonding (BRAD JOHNSON)
5. RE: Anisotropic c-Si RIE (ShuTing Hsu)
6. will HF damage Chrome layer? (Yilei Zhang)
7. Enquiry on MEMS programme (sandeep hs)
----------------------------------------------------------------------
Message: 1
Date: Fri, 31 Oct 2003 07:09:28 -0800 (PST)
From: Imran Ghauri
Subject: [mems-talk] Chromium Silicide (CrSi2) thin film sputtering
!!!!!!!!!
To: [email protected]
Message-ID: <[email protected]>
Content-Type: text/plain; charset=us-ascii
Hi,
Does anyone know where can we sputter thin film of
Chromium silicide (CrSi2)?
thanks !!!!!!
Imran (USA)
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Message: 2
Date: Fri, 31 Oct 2003 11:22:43 -0600 (CST)
From: Yilei Zhang
Subject: [mems-talk] sio2 etchant
To: [email protected]
Message-ID: <[email protected]>
Hi all,
Is there any sio2 etchant that will not damage metal mask, for example, chrome
or Al? thanks.
Regards,
Yilei Zhang
------------------------------
Message: 3
Date: Fri, 31 Oct 2003 13:08:23 -0500 (EST)
From: Linda LW Chow
Subject: [mems-talk] Localized stress measurement
To: General MEMS discussion
Message-ID:
Content-Type: TEXT/PLAIN; charset=US-ASCII
HI Everyone,
I have a Au surface with localized stress around 10nm. Would there be any
means to measure this stress?
Any ideas are appreciated,
Linda:)
------------------------------
Message: 4
Date: Fri, 31 Oct 2003 13:26:07 -0500
From: "BRAD JOHNSON"
Subject: Re: [mems-talk] Solgel process / low temperature bonding
To: ,
Message-ID:
Content-Type: text/plain; charset=US-ASCII
Hello Bob,
How low a temp are you looking at? We have achieved very good results bonding
Pyrex to Pyrex and Pyrex to Silicon at room temp then annealing at much less
then 300C. If you are looking for a permeant bond this would work great.
Brad
Brad Johnson
Suss MicroTec
Applications Engineer
1-480-557-9370 Ext119
1-800-685-7877 Ext119
[email protected]
>>> [email protected] 10/23/03 06:44PM >>>
Hello All,
Is sol-gel process a good method to bond glass? If anybody has experience with
that type of procedure, can you please share it with me?
Are there any other way of bonding glass using low temperature?
Any information will be appreciated.
Thanks,
Robert
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Oct 23 20:00:18 2003
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Date: Thu, 23 Oct 2003 19:59:53 -0400
From: Alik Widge
Subject: Re: [mems-talk] Photosensitive SAM
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Yi-Ping,
Most self-assembled monolayers are sensitive to UV-induced desorption if
the dose is high and long enough, especially the thiol-based SAMs. Look
through George Whitesides' paper archive at Harvard and you'll find 99% of
what you need.
Alik
--On Thursday, October 23, 2003 8:44 AM +0800 Yi-Ping Ho
wrote:
> Hi there,
>
> Is there any one who knows how to make the photosensitive SAM(Self
> Assemble Monolayer)? Or any reference papers?
>
------------------------------
Message: 5
Date: Fri, 31 Oct 2003 16:11:54 -0800
From: "ShuTing Hsu"
Subject: RE: [mems-talk] Anisotropic c-Si RIE
To: "'General MEMS discussion'"
Message-ID: <001401c3a00c$c1a036a0$b55a6180@PolarBear>
Content-Type: text/plain; charset="us-ascii"
Hi Jobert,
Why don't you try a single step process with C4F8/SF6 about 1:1
(50sccm?) and low pressure (10mT??).
Etch rate will be slower than BOSCH. But it would work with your
application with a little process tuning.
Sidewall should be VERY smooth with no scalloping whatsoever.
Let me know how it goes. You can email me directly if you wish to know
more detail.... I can try to help
You. Which chamber do you have? Plasma therm? STS? Or Applied DPS-DT?
ShuTing
Graduate Student
UCLA EE Department
Email: [email protected]
-----Original Message-----
From: [email protected]
[mailto:[email protected]] On Behalf Of
Jobert van Eisden
Sent: Monday, October 27, 2003 4:05 PM
To: '[email protected]'
Subject: [mems-talk] Anisotropic c-Si RIE
Dear all,
We are trying to etch vias (3-10 um) to a depth of 5 um with sidewall
roughness under 30 nm. The mask we use is 1 um thermal oxide. I would
like to ask you all if there is any way the Bosch process can be
adapted, or if there is a gas chemistry we can use to do a RIE process
that gives us these smooth sidewalls. There should be little or no mask
undercut.
We have tried running a Bosch like recipe using very little ICP power
and short cycles, which gave us too much sidewall roughness. The
available chemistries are CHF3, CF4, O2 and N2 on the dieletrics chamber
and SF6, C4F8, O2 and Ar on the Bosch chamber.
I would very much appreciate ideas and suggestions.
Regards,
Jobert van Eisden
Graduate student
SUNY Albany
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Message: 6
Date: Sun, 2 Nov 2003 17:42:09 -0600 (CST)
From: Yilei Zhang
Subject: [mems-talk] will HF damage Chrome layer?
To: [email protected]
Message-ID: <[email protected]>
Hi all:
Can anyone tell me whether chrome layer can survive in HF etching sio2? if
not, is there any other SiO2 etchant will not damage Chrome? thanks.
Regards,
Yilei Zhang
------------------------------
Message: 7
Date: Mon, 3 Nov 2003 04:14:49 -0800 (PST)
From: sandeep hs
Subject: [mems-talk] Enquiry on MEMS programme
To: [email protected]
Message-ID: <[email protected]>
Content-Type: text/plain; charset=us-ascii
Hello every body,
this is Sandeep working as a CAD engineer @ IISc , bangalore.
i have couple of doubts in pursuing higher studies in MEMS .
i got seat for MSc in MEMS technology @ NTU (nanyang Technological university )
, Singapore.
all i want to know is How's this particular course @ NTU ,
what is the job prospect after finishing this programme .
also what's the chance of getting a seat for Phd programme on empahsis to MEMS.
please feel free to answer this query .
thanks
sandeep
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Date: Mon, 03 Nov 2003 09:29:17 -0800
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To: General MEMS discussion
Subject: Re: [mems-talk] where to buy master for microchannel fabrication
References: <010301c39f88$4879db20$bb20e30a@HongWang>
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Dear Hong,
I think we can make a master for you in silicon if you are interested.
Please feel free to contact me.
Michael Pedersen
--
MEMS-Exchange
Corporation for National Research Initiatives
1895 Preston White Drive, Ste. 100
Reston, VA 20191-5434
e-mail: [email protected]
Please visit us @: www.mems-exchange.org
Hong Wang wrote:
> Dear All,
> We want to do some DNA analysis in microchannels. The channel size maybe
100micro width, 20-50 micro depth and 1cm length. We don't want to fabrication
master by ourself. Does anyone know where can we buy some? Any proper material
of master suitable for PDMS channel fabrication is fine.
> Thank you.
> Hong
> _______________________________________________
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