hellow..i had tried to use sputtering of cr/copper ..the best result is 50
micron meter almost without mousebites and pinholes on the glass surface after
removal of the masking layer.....Btw do u all have any jobs for me to work in
semiconductor engineering field and preferably it is in singapore cause i am
bonded in singapore for 3 years...


Vincent wong bien shin (fresh graduate)
Mechanical and production engineering(specialize in semiconductor fabrication)
Nanyang Technological University

________________________________

From: [email protected] on behalf of Tom
Fan
Sent: Sat 12/6/2003 9:28 AM
To: [email protected]
Subject: [mems-talk] Etch mask for glass etching



Hi All,

When people use Cr/Au as the etch mask for wet etching of glass, what kind of
deposition method did they use? I used resistive evaporation method and found
the metal film collapsed and gave way to the etchant in a very short time. I
suspect the film adhesion is not that good. Maybe sputtering will do a better
job? Anybody had experience with this situation? Any thoughtful input would be
appreciated.

Thanks,
Tom Fan

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