Hi Pimpim,

I had some adhesion problem before. I solve my problem by first
pre-cleanning the samples just before loading them in the E-beam with
HCl(5%)  and then HF(5%). And then after the lift-off and photoresist
stripping I have done a Rapid Thermal Annealling of 60 sec at 350C.

The metal I use is Cr/Ni/Au   with 10nm/25nm/250 nm

Good luck

Richard Beaudry
Associé de recherche
Laboratoire de micro-fabrication
École Polytechnique