Hello Hasan,

yes you can, you just have to make sure that your resist is quite a bit
thicker than the gold layer you want to evapurate. We are using Shipley
Microposit S1818 which gives a 1.6um thick layer spinning 40s at
6000rpm. If you evapurate thick layers it also helps to put the wafer 15
min in chlorobenzene after soft bake (usually 15 min in 90 deg. oven).

regards,

Karin

[email protected] schrieb:

>Hi
>
>Actually, I spined a PDMS layer on a SI wafer. After curing, I need to transfer
>my pattern on the PDMS layer by gold deposition and using lift off process.Can
I
>make my pattern by photoresit and then evaporate gold? Is there any special
recepie?
>
>Best regards,
>Hasan Sharifi
>Purdue University
>
>
>

--
Dipl.-Ing. Karin Buchholz

Walter Schottky Institut
Technische Universitaet Muenchen

Am Coulombwall 3
D-85748 Garching

Tel: +49-89-289 12776
Fax: +49-89-320 6620