Dear mems-talk community,

I am looking for wet etch chemistries that allow to remove PSG oxide or SiC
selective to silicide, with selectivities S > 20 for SiO2:silicide or S > 10 for
SiC:silicide.

I guess buffered HF solution could do the job for SiO2:NiSi (confirmation?), but
I am not aware of any solution able to remove SiC selectively to NiSi or CoSi.

Do any of you have some skills with this respect??

Thanks a lot for your help!

Jean-Francois de Marneffe