I agree: pure SiO2 can be deep etched.
STS has a silicon dioxide etcher that, at its fastest, does something like
0.4 um/min, but nothing like the silicon etch rates.
To plasma-etch a material, the etch products must be volatile.
I don't have a graph of fluoride and chloride vapor pressures in front of
me,
but I think glass containing sodium and potassium will be tough in any
chemistry.
Pyrex 7740 also has aluminum and boron.
The Al isn't etched in F chemistries, and for Cl chemistries the temperature
has to be above about 60 C to get a decent etch rate.
Another option is adding a lot of "sputtering" ion flux.
I've heard of platinum and copper being etch in ICP etchers.
    --Kirt Williams

----- Original Message -----
From: "mizur" 
To: "General MEMS discussion" 
Sent: Friday, January 16, 2004 7:55 AM
Subject: Re: [mems-talk] Ask for dry etching machine that can do
sodalimeglass etching?


> I think quartz etches pretty well. The aditives in the glass / pyrex kill
> the process. I think the chemistry is as a chalange as the hardware.
> Shay
> ----- Original Message -----
> From: 
> To: "General MEMS discussion" 
> Sent: Friday, January 16, 2004 1:54 AM
> Subject: Re: [mems-talk] Ask for dry etching machine that can do soda
> limeglass etching?
>
>
> > This sounds like a great challange for the MEMS community. Why don't we
> try to get a forum together to discuss ideas on how to dry etch pyrex,soda
> lime glass, quartz ect. Let's try something like "The ideal dry etch tool
> for etching pyrex ect would have the following hardware/process features."
> >
> > I would submit that the system must have an electrostatic helium
backside
> clamp capable of holding glass wafer with backside pressure of say 20 torr
> and a gas flow of <1sccm
> > Bob Henderson
> >
> > Next?????????
> >
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> >
>
>
>
> _______________________________________________
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