Isa,

We would have to know what you are trying to oxidize in order to help you on
this.
If you are growing an oxide on silicon, you just need enough N2 gas flow to push
the steam into the tube if using a bubbler with the water temp just under
boiling.  Silicon will give you 1um of oxide in 4 hours at 1000c.

Brent

Isa Kiyat wrote:

> I am trying to establish a thermal wet oxidation setup. I designed and
> purchased all equipments (furnace, glassware, hotplate etc.) except a
> flow-meter for monitoring the nitrogen flow through the water. I need to
> know the range of flow rate required for a wet oxidation at about 900-1000 C
> temperature. I will be pleased to hear your experience and/or opinions.
> Thanks
> =================================
>
> Isa Kiyat
>
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