with the two layer strusture in SU8, it's better to developp everything in
one time, at the end of the process.
it will be much longer but it doesn't matter for the top layer...


----- Original Message -----
From: 
To: 
Sent: Tuesday, February 03, 2004 7:35 PM
Subject: [mems-talk] 2 level SU-8 lithography


> Hello All.
>
>               I am working on 2 level SU-8 lithography now. The first
> layer is about 50um thick and have a feature size of 50um; the second
> layer is 10-20um thickness, the feature size is about 25um.
>
>               I need suggestions right now. Should I develop both layers
> at once after PEB of second layer, or can I develop the first layer and
> spin on the second?
>
>               Also is there any particular precautions I should take in
> 2 level SU-8 lithography?
>
>               I also appreciate if someone can suggest related
> literatures.
>
> best,
> Leidong Mao
>
>
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