When removing Au and then Cr from Glass we found a small amount of Cr oxide on
the surface of the glass.  We found that it could be removed by a quick (few
second) dip back into the Au etch.

--
Shane McColman
Research Professional
NanoFab, University of Alberta
W 1-028 ECERF Building
Edmonton AB, Canada

On February 6, 2004 02:44 am, Paolo Tassini wrote:
> Hi everyone!
> We are doing two metallization layers to connect a matrix of polysilicon
> TFTs. We did first a chromium deposition and patterning, then we deposited
> PECVD silicon oxide, etched via-holes through oxide with BHF and in the end
> another chromium layer. When we tried to do some electrical measurements we
> found out that everything was isolated! We discovered that wet etching of
> silicon oxide on top of chromium turns this one into chromium oxide, which
> is insulating and very hard to scratch.
> Please, does anyone know how to remove this layer of chromium oxide?
> We would like to recover this circuit somehow!
> We can do wet and dry etching (CF4, NF3, Ar RIE, O2, H2)
> Thank you very much in advance!
>
> Ing. Paolo Tassini
> Centro Ricerche ENEA
> Via Vecchio Macello, s.n.c.
> 80055    Portici    (NA)    Italy
> tel. +39 081 7723289
> fax +39 081 7723344
> e-mail [email protected]
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