Hi Jan,
I had not heard from anyone in a while about my inquiries about dry-film resists
and gray-scale lithography, hence just discover your email while cleaning out my
email box. Thanks for the feedback.
Basically we have tried a negative dry-film resist call Fujifilm Olin VANX (20
microns thick). Our problem was not lamination, but repeatability of grey-scale
results (+/- 14%). We need < +/- 7%. It is my understanding that grey-scale
lithography should be pursued with only positive photo-resists with low contrast
or process means to reduce the apparent contrast of the resist. Jan, I would be
appreciative if you or any other reader of this email could point me in the
direction of a thick (20-120 micron), positive dry-film resist with reasonably
high resolution and low contrast or process means to effect a low contrast.
Jan, any thoughts or recommendations?
Best regards,
Fred
E-Business Card
Fred Thomas
Chief Technologist
Advanced Research & Development, R&D
Iomega Corporation
Building 8
1821 West Iomega Way
Roy, Utah 84067
USA
P: 801-332-4662
Fax: 801-332-5434
email: [email protected]
-----Original Message-----
From: [email protected] [mailto:mems-talk-
[email protected]] On Behalf Of Jan Friday
Sent: Tuesday, January 27, 2004 9:42 AM
To: '[email protected]'
Subject: [mems-talk] dry film resist
Did you solve this problem? I used a different film but had the same thing
happen. First of all I had the wrong dilution (too strong) for the
developer!! So I rectified that but still had the film coming off the
sample. Surface cleanliness is important to get good adhesion, so check
that. I found that my film eventually adhered when I increased the exposure
time. I had enough exposure before to develop a good pattern but not enough
to chemically change the film enough to give it good adhesion to the
substrate. Hope this helps.
Jan
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