TLM structure for measuring the specific contact
resistance
hare krishna
2004-02-11
Dear All,
Can anybody suggest me the dimensions for the TLM mask(Transmission
Line Method) that is the width of contact and the separation between them, used
for the measurement of specific contact resistance by photolithography process.
Hare Krishna
hare krishna wrote:
Dear Dave,
Thanks for your reply but sir, I also want to know about the solution making
procedure because last time I just mixed the KI and I2 powders and made the
solution with DI water, which is not the correct way of making the solution
because Iodine is very volatile.
Hare Krishna
aasutosh dave wrote:
Hare Krishna,
I use 20gm KI : 5gm Iodine : 160 ml DI water. You can change the
concentration too to achieve higher etch rates. If you want you can reuse it
for few times but not more as you will notice the etch rate will change each
time you resue it. As far as I know you can preserve in any sealed glass or
plastic bottle.
Regards,
Aasutosh Dave
Nanofab Center
Arlington, Texas
>From: hare krishna
>Reply-To: General MEMS discussion
>To: [email protected]
>Subject: [mems-talk] Preparation of KI+I2+DIwater solution for gold etching
>Date: Sun, 8 Feb 2004 05:47:03 +0000 (GMT)
>
>
>Dear All,
> How should I make the solution of KI + I2 + DI water for the
>gold etching. Should I use it fresh or I can use it for long time...and how
>should it be preserved.
>Regards
>Hare Krishna
>
>
>
>Yahoo! India Education Special: Study in the UK now.
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_______________________________________________
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Visit us at http://www.memsnet.org/
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