A MEMS Clearinghouse® and information portal
for the MEMS and Nanotechnology community
RegisterSign-In
MEMSnet Home About Us What is MEMS? Beginner's Guide Discussion Groups Advertise Here
News
MEMSnet Home: MEMS-Talk: Anisotropic Silicon Dioxide Reactive Ion Etching
Anisotropic Silicon Dioxide Reactive Ion Etching
2004-02-13
frank berisford
2004-02-13
Isaac Wing Tak Chan
2004-02-14
Tommi Tapani Piirainen
Anisotropic Silicon Dioxide Reactive Ion Etching
Isaac Wing Tak Chan
2004-02-13
Hi Frank,

        Perhaps you wanna try removing O2 from your plasma chemistry or
increasing your RIE power?


Yours sincerely,

Isaac Chan

Ph.D. Candidate
Dept. Electrical & Computer Engineering
University of Waterloo
200 University Ave. W
Waterloo, Ontario, Canada
N2L 3G1
Tel: (519) 888-4567, ext. 6014
Fax: (519) 746-6321
[email protected]
http://www.ece.uwaterloo.ca/~a-sidic


On Fri, 13 Feb 2004, frank berisford wrote:

> Hello all,
>
> Over the past few weeks I've been trying to get a highly anisotropic silicon
> dioxide etch recipe for 2 different feature sizes.  I was able to obtain
> acceptable results on 0.5 micron features.  However the recipe didn't work so
> well for larger (50 micron) features.  My current recipe is a CHF3/O2
chemistry
> at very low power and flow rates.  My optimised etch for the small features
has
> no effect on the larger features other than decreased etch rate.
>
> Thanks for any insight you can offer,
> Frank
>
> _______________________________________________
> [email protected] mailing list: to unsubscribe or change your list
> options, visit http://mail.mems-exchange.org/mailman/listinfo/mems-talk
> Hosted by the MEMS Exchange, providers of MEMS processing services.
> Visit us at http://www.memsnet.org/
>



reply
Events
Glossary
Materials
Links
MEMS-talk
Terms of Use | Contact Us | Search
MEMS Exchange
MEMS Industry Group
Coventor
Harrick Plasma
Tanner EDA
Mentor Graphics Corporation
Nano-Master, Inc.
Addison Engineering
MEMStaff Inc.