Dear Octavian
Some years ago we found that a thin-film of patterned SU8 worked out OK for a
quick photoanodic etch.
Cheers
David
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Professor David Barrow
Laboratory for Applied Microsystems & NanoFAB
Cardiff School of Engineering
Cardiff University
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United Kingdom
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>>> [email protected] 17/02/04 12:04 PM >>>
Hi,
I need a mask to hold to HF.
I need to porosify Si-wafers
(electrochemically in HF:ethanol,
1:3 vol, currents up to 3 mA/cm2).
Anybody any suggestion ?
Many thanks,
Octavian
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