Dear Colleagues:
I am looking to deposit silicon by chemical vapor deposition into pre-cast
structures. The thickness of the deposited silicon will range from 500
microns to 5 mm. Issues associated with aspect ratio and "key-holing" will
be part of the experimental effort.
Any takers?
Thanks.
Robert S. Okojie, Ph.D.
NASA-Glenn Research Center
Sensors and Electronics Branch
21000 Brookpark Road, M/S 77-1
Cleveland, OH 44135.
Ph: 216/433-6522; Fax: 216/433-8643
e-mail: [email protected]
http://www.lerc.nasa.gov/WWW/SiC/SiC.html
